Niobium Sputtering Targets
SIZEN provides high-purity niobium sputtering targets for touchscreens, semiconductors, Low-E glass, and anti-reflective (AR) coatings. Our targets are designed with a dense structure, uniform grain size, and controlled texture, ensuring smooth, consistent coatings and stable sputtering performance.
We offer planar and rotary niobium sputtering targets in a range of sizes to fit different applications. Common options include 8-inch (200 mm) and 12-inch (300 mm) round targets, with larger custom disc targets available up to 29 inches (737 mm) in diameter.
With high purity, precise dimensions, and reliable performance, SIZEN's niobium sputtering targets help create high-quality, long-lasting coatings for advanced industries. Contact us today for a quote or to request custom sizes!
Our NiobiumSputtering Targets Specifications
Niobium Sputtering Target Information
- Material: Pure Niobium
- Standards: ASTM B393-05
- Grade: RO4200-1, RO4210-2
- Purity: 99.9%, 99.95%, 99.99%, 99.995%
- Diameter: <= 16 inch
- Density: 8.57 g/cm³ @20°C
- Melting Point: 2477 °C
- Boiling Point: 4742°C
- Thermal Conductivity: 0.537 W/cm/K @ 298.2 K
- Electrical Resistivity: 12.5 microhm-cm @ 0 °C
Niobium Sputtering Target Dimensions and Tolerance
Capacitor Grade Tantalum Powder
| Thickness (mm) | Tolerance (mm) | Diameter (mm) | Diameter Tolerance (mm) | |
|---|---|---|---|---|
| Grade I | Grade II | |||
| 3-8 | ±0.1 | ±0.2 | 50-450 | ±0.2 |
| 8-14 | ±0.1 | ±0.2 | 50-450 | ±0.2 |
| ≥14 | ±0.1 | ±0.2 | 50-400 | ±0.2 |
Rectangular Sputtering Target:
| Thickness (mm) | Tolerance (mm) | Width (mm) | Width Tolerance (mm) | Length (mm) | Length Tolerance (mm) | |
|---|---|---|---|---|---|---|
| Grade I | Grade II | |||||
| 3-8 | ±0.1 | ±0.2 | 50-400 | ±0.2 | 50-1800 | ±0.2 |
| 8-14 | ±0.1 | ±0.2 | 50-350 | ±0.2 | 50-1500 | ±0.2 |
| ≥14 | ±0.1 | ±0.2 | 50-300 | ±0.2 | 50-1200 | ±0.2 |
Why Choose SIZEN as Your Niobium Sputtering Target Supplier?
High-Purity Niobium
99.95% pure niobium for minimal contamination
High Density Structure
95-99% density for efficient sputtering
Precision Machining
±0.1 mm tolerance and Ra 0.8–1.6 µm surface roughness.
Superior Surface Finish
Smooth, high-quality finish ensures purity and performance.
Real-World Testing
Tested in a PVD lab for reliable coating results.
5 MAIN REASONS TO CHOOSE US
1
Ultra-High Purity for Minimal Contamination
We select high-purity raw materials with extremely low impurity levels, reaching a minimum purity of 99.95%.
2
High-Density Structure for Superior Performance
SIZEN uses advanced melting and processing techniques to increase the density of our niobium sputtering targets to 95-99%, ensuring efficient sputtering, better film uniformity, and longer target lifespan.
3
Precision Machining for Accurate Fit
Our CNC machining center ensures each niobium sputtering target meets tight tolerances of ±0.1 mm, with a surface roughness of Ra 0.8–1.6 µm. This guarantees a perfect fit, stable sputtering rates, and consistent film thickness.
4
Superior Surface Finish
Our targets feature a highly refined surface with minimal impurities and defects, ensuring excellent material purity and consistent results in high-precision applications.
5
Real-World Testing for Reliable Coatings
We test our sputtering targets in a PVD application lab to ensure they meet your exact coating requirements with detailed analysis and optimization.
Unique Properties of Niobium Sputtering Target
High Purity for Clean Coatings
With 99.95% pure niobium, our sputtering targets ensure low impurity levels, reducing contamination and improving film quality in high-tech applications.
Excellent Corrosion Resistance
Niobium naturally forms a protective oxide layer, making it highly resistant to oxidation and chemical corrosion, ensuring stable performance in demanding environments.
Superior Mechanical Strength
With high density (95-99%) and precise grain structure, our niobium targets offer enhanced durability, uniform sputtering rates, and consistent film deposition.
High Thermal and Electrical Conductivity
Niobium's excellent conductivity allows for efficient energy transfer, making it ideal for semiconductor, optical, and thin-film applications.
Smooth Surface for Stable Sputtering
Precision machining ensures a surface roughness of Ra 0.8–1.6 µm, providing a smooth, even surface for consistent film thickness and improved adhesion.
Get a Quote for High-Purity Niobium Metal
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Manufacturing Process of Niobium Sputtering Target
We begin with 99.95% pure niobium powder, carefully selected to maintain low impurity levels and ensure consistent material quality.
The niobium powder is cold-pressed into a target shape under high pressure, forming a compacted structure with high initial density. This step ensures uniform material distribution, reducing defects in the final product.
The compacted niobium is then sintered in a vacuum or controlled atmosphere furnace at high temperatures. This process fuses the powder particles together, increasing the target's density, improving mechanical strength, and ensuring a fine, uniform grain structure.
To further improve density and eliminate internal porosity, the sintered niobium undergoes Hot Isostatic Pressing (HIP). This process applies high temperature and pressure uniformly, ensuring a fully dense, high-strength target that performs consistently in sputtering applications.
The sintered niobium target is CNC machined to ensure accurate dimensions, tight tolerances (±0.1 mm), and a smooth surface finish (Ra 0.8–1.6 µm) for stable sputtering performance.
A controlled heat treatment process is applied to relieve internal stresses and improve thermal stability, ensuring the target maintains its properties under high-temperature sputtering conditions.
The target is polished and inspected to ensure a smooth, defect-free surface, which is essential for achieving consistent thin-film deposition in high-precision applications.
Each niobium sputtering target undergoes rigorous testing to ensure high purity, optimal density, precise dimensions, and a smooth surface, guaranteeing reliable performance in sputtering applications.
Once the targets pass all quality tests, they are carefully packaged to prevent damage and ensure safe delivery to customers worldwide.
Mixing Machine
Sintering Furnace
Die Forging
Annealing Furnace
Cold Rolling Mill
Straightening Machine
CNC Deep Hole Drilling Machine
Grinding Machine
Wire Drawing Equipment
Wire Cutting Machine
Handheld XRF Analyzer
Scanning Electron Microscope
Niobium Sputtering Target Applications: Versatility Across Industries
Touchscreens & Displays
Used in smartphones, tablets, and LCD/OLED screens, niobium coatings improve durability, conductivity, and optical clarity.
Semiconductors & Microelectronics
Essential for chip manufacturing, integrated circuits, and resistors, ensuring stable electrical performance and precise film deposition.
Low-E Glass (Energy-Saving Windows)
Niobium thin films help make architectural and automotive glass more energy-efficient, reducing heat loss and improving insulation.
Anti-Reflective (AR) Coatings
Applied to camera lenses, optical instruments, and high-precision glass, niobium coatings reduce glare and enhance visibility.
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