Tantalum Sputtering Target
Unlock Advanced Coatings with SIZEN Tantalum Sputtering Targets
At SIZEN, we are committed to providing high-quality materials for industries that demand precision and reliability. With years of experience, we take pride in delivering products that meet the most stringent standards of excellence. Our dedication to innovation and customer satisfaction drives us to continuously improve and expand our offerings, ensuring that we stay at the forefront of the industry.
Our tantalum sputtering targets are designed to unlock the potential for advanced coatings, delivering superior results in every application. With a focus on consistency and performance, SIZEN tantalum sputtering targets offer unmatched quality, helping businesses achieve precise and reliable deposition processes. Trust SIZEN to provide the materials that support your growth and innovation.
Our Tantalum Sputtering Target Specifications
Tantalum Sputtering Target Information
| Purity | Ta>99.95%, 99.99% |
|---|---|
| Standard | ASTM B708-05 |
| Density | >16.1g/cc |
Tantalum Sputtering Target Sizes
| Thickness | Tolerance | Width | Tolerance | Length | Tolerance | |
|---|---|---|---|---|---|---|
| Grade I | Grade II | |||||
| 45724 | ±0.1 | ±0.2 | 50-400 | ±0.2 | 50-1500 | ±0.2 |
| 45883 | ±0.1 | ±0.2 | 50-350 | ±0.2 | 50-1200 | ±0.2 |
| ≥14 | ±0.1 | ±0.2 | 50-300 | ±0.2 | 50-1000 | ±0.2 |
Why Choose Our Tantalum Sputtering Target
Manufactured to the highest standards for uniformity and reliability.
Combining advanced technology and expertise for precise targets.
Customized targets to meet your unique production requirements.
Environmentally conscious production with minimal impact.
Serving clients worldwide with reliable and timely delivery.
5 MAIN REASONS TO CHOOSE US
1
Consistent High Quality
Our tantalum sputtering targets are manufactured to the highest standards, ensuring uniformity and reliability in every batch, helping you achieve consistent results.
2
Expert Craftsmanship
With years of experience, SIZEN combines advanced technology with expert craftsmanship to produce tantalum sputtering targets that meet the most demanding specifications.
3
Tailored Solutions
We understand that every project is unique. SIZEN offers customized tantalum sputtering targets to meet specific needs, ensuring optimal performance for your production requirements.
4
Commitment to Sustainability
At SIZEN, we prioritize environmentally conscious manufacturing practices, ensuring that our products are produced with minimal impact on the environment while meeting all industry standards.
5
Global Reach with Dedicated Service
SIZEN serves clients across the globe, ensuring that our tantalum sputtering targets reach businesses in every corner of the world. We offer reliable and timely delivery for all our customers.
Unique Properties of Tantalum Sputtering Target
High Melting Point
Tantalum has a melting point of 3017°C, making it ideal for high-temperature applications.
Corrosion Resistance
Tantalum Sputtering Target resists corrosion in harsh environments and is chemically inert to most substances.
Good Conductivity
Tantalum sputtering target's excellent electrical conductivity ensures stability in high-temperature electronics.
Ductility
Even at elevated temperatures, tantalum sputtering target remains ductile, allowing for easy forming into thin films.
Chemical Stability
Tantalum sputtering target exhibits exceptional chemical stability, ensuring reliability in challenging processes.
High Density
Tantalum sputtering target's high density makes it effective for applications requiring compact, heavy materials.
Get a Quote for Tantalum Sputtering Target
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Manufacturing Process of Tantalum Sputtering Target
High-purity tantalum powder is sintered to create a solid block, which forms the foundation for the target.
The sintered block is placed in a high-vacuum electron beam melting furnace to produce a high-purity tantalum ingot.
The tantalum ingot undergoes iterative plastic deformation (such as rolling) and annealing to achieve a consistent crystal structure and internal texture.
Through these processes, the material is shaped into a tantalum target blank with consistent grain structure and internal texture.The tantalum target blank is then welded to a back plate.
The welded target undergoes precision machining to achieve the desired dimensions and surface finish for optimal sputtering performance.
Mixing Machine
Sintering Furnace
Die Forging
Annealing Furnace
Cold Rolling Mill
Straightening Machine
CNC Deep Hole Drilling Machine
Grinding Machine
Wire Drawing Equipment
Wire Cutting Machine
Handheld XRF Analyzer
Scanning Electron Microscope
Tantalum Sputtering Target Applications Across Industries
High Melting Point
Tantalum has a melting point of 3017°C, making it ideal for high-temperature applications.
Aerospace Components
Tantalum is used to coat parts of spacecraft and aircraft, providing resistance to heat and corrosion in extreme environments.
Medical Devices
Due to its biocompatibility and corrosion resistance, tantalum is used in medical implants and surgical tools for durability and long-term performance.
Chemical Processing
Tantalum sputtering targets are employed in chemical processing equipment, where their resistance to heat and corrosive substances ensures reliability.
Capacitors
Tantalum is widely used in electronics for producing capacitors, providing high capacitance in compact, space-sensitive devices.
Magnetic Storage
In magnetic storage devices like hard drives, tantalum sputtering targets are used to deposit durable films that enhance performance and lifespan.
Decorative Coatings
Tantalum sputtering targets are used to produce decorative coatings for consumer products like jewelry and watches, providing a distinctive, attractive finish.
Thin-Film Solar Energy
Tantalum sputtering targets are utilized in the production of thin-film solar cells, improving their efficiency and overall reliability.
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